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Effect of PVD Process Parameters on the TiAlN Coating Roughness

Md Nizam A.R., and Swanson, P., and Mohd Razali M., and Esmar, B., and Abdul Hakim H., (2010) Effect of PVD Process Parameters on the TiAlN Coating Roughness. Journal of Mechanical Engineering and Technology, 2 (1). pp. 41-54. ISSN 2180-1053

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Official URL: http://www.utem.edu.my

Affiliations

Universiti Teknikal Malaysia Melaka. Faculty of Manufacturing
Coventry University, UK. Faculty of Engineering and Computing
Universiti Teknikal Malaysia Melaka. Faculty of Manufacturing
Universiti Teknikal Malaysia Melaka. Faculty of Manufacturing
Advanced Materials Research Center, Sirim Berhad

Abstract

Coating on cutting tools has been proven to improve tool life significantly. Physical Vapour Deposition sputtering process is one on the main techniques to deposit coating on cutting tool. One of the coating characteristics that
influence its performance is coating surface roughness. Extensive research has been carried out to understand the effect of process parameters on the resulting coating roughness. However holistic study to understand the combination of parameters and their interactions are lacking. The objective of this study is to evaluate the effect of coating process parameters (substrate bias voltage, substrate temperature, and sputtering power) on the deposited TiAlN coating roughness using response surface methodology. Coating roughness characterization was done using Atomic Force Microscopy apparatus. Aside from that coating microstructure was also investigated using XRD and SEM. Finding from this research suggested that sputtering power, interaction between sputtering power and substrate temperature, and substrate bias quadratic term significantly influence the deposited coating surface roughness.

Item Type:Journal
Keywords:Sputtering, TiAlN, surface roughness, PVD, interaction, RSM
Subjects:T Technology, Engineering
ID Code:10886

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