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Bipolar Pulsed-DC Power Supply for Magnetron Sputtering and Thin Films Synthesis

Weerasak Somkhunthot, and Thanusit Burinprakhon, and homas, Ian, and Tosawat Seetawan, and Vittaya Amornkitbamrung, (2007) Bipolar Pulsed-DC Power Supply for Magnetron Sputtering and Thin Films Synthesis. Elektrika Journal of Electrical Engineering, 9 (2). pp. 20-26. ISSN 01284428

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Official URL: http://fke.utm.my/elektrika/dec07/paper4dec07.pdf

Affiliations

Khon Kaen University, Thailand. Dept. of Physics
Thailand, Sakon Nakhon, Sakon Nakhon Rajabath University, Thailand. Dept. of Physics

Abstract

A pulsed-dc power supply has been designed and constructed for use in a magnetron sputtering system and for thin film synthesis. The power supply consists of three major parts: (1) two high voltage direct current (dc) power supplies utilizing a phase control circuit for power delivery, (2) pulse generator and two power switching circuits, and (3) feedback circuits for current and voltage controls, displays, and safety measures. For a high level of safety operation, optical connections were employed in the circuit design for complete isolation between low and high voltage sections. The constructed power supply was tested using a test load consisting of ten 100 W 250 V light bulbs with tungsten filaments connected in series. It was found that the power supply was capable of supplying either symmetric or asymmetric pulsed-dc power of maximum peak-to-peak voltage of 1250 V. The negative and positive pulse widths were selectable between 10-100 μs, with maximum pulse frequency of 30 kHz. This frequency limit is due to the limited speed of the power transistors used in the power switching circuit operating at high voltage. It is anticipated that the constructed power supply can be used as a plasma generator in a magnetron sputtering system for the deposition of oxide thin films such as Al2O3, NaxCo2O4, ITO and ZnO.

Item Type:Journal
Keywords:Magnetron sputtering system, Pulsed-DC power supply, Thin film synthesis.
Subjects:T Technology, Engineering
ID Code:2452

[1] G.O. Este and W.D. Westwood, “Reactive Sputtering,” Handbook of Thin Film Process Technology, vol.98/1, pp. A5.2:1-9, 1998.

[2] H. Gueldner, H. Wolf, F. Eckholz and F. Schrade, “A Novel Topology for Pulse Generators in Magnetron Sputter Systems,” IEEE National Center of Research and Technological Development -CENIDET-: VII IEEE International Power Electronics Congress 2000. Technical proceedings, Mexico, pp. 365-370, October 15-19, 2000.

[3] W.J. Lee, Y K. Fang, J J. Ho, C.Y. Chen, S.F. Chen, R.Y. Tsai, D. Huang and F.C. Ho, “Optimizing indiumtin oxide thin films with bipolar d.c.-pulsed magnetron sputtering for electrochromic device applications,” Journal of Materials science: Materials in Electronics. vol. 13, no. 12, pp. 751- 756(6), December 2002.

[4] J.L. Andújar, M. Vives, C. Corbella and E. Bertran, “Growth of hydrogenated amorphous carbon films in pulsed d.c. methane discharges,” Diamond and Related Materials. vol. 12, no. 2, pp. 98-104(7), February 2003.

[5] M. Fink, C. Löcker, J. Laimer, C. Mitterer and H. Störi, “Utilizing bipolar pulsed PACVD for the deposition of alumina hard coatings,” Surface and Coatings Technology. vol. 188-189, pp. 281-286, November-December 2004.

[6] A. Belkind, A. Freilich, J. Lopez, Z. Zhao, W. Zhu and K. Becker, “Characterization of pulsed dc magnetron sputtering plasmas,” New Journal of Physics. vol. 7, iss. 1, pp. 90, April 2005.

[7] Th. Dunger, Th. Welzel, St. Welzel and F. Richter, “Time-resolved investigation of an asymmetric bipolar pulsed magnetron discharge: Influence of pressure,” Surface and Coatings Technology, vol. 200, iss. 5-6, pp. 1676-1682, November 2005.

[8] H.C. Barshilia, B. Deepthi, A.S. Arun Prabhu and K.S. Rajam, “Superhard nanocomposite coatings of TiN/Si3N4 prepared by reactive direct current unbalanced magnetron sputtering,” Surface and Coatings Technology. vol. 201, Issue 1-2, pp.329- 337. September 2006.

[9] I. Swindells, P.J. Kelly and J.W. Bradley, “Influence of substrate conditions on the temporal behaviour of plasma parameters in a pulsed dc magnetron discharge,” New Journal of Physics. vol. 8, no. 4, pp. 47, April 2006.

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[10] S. Sugimoto, M. Kiuchi, S. Takechi, K. Tanaka and S. Goto, “Inverter plasma discharge system,” Surface and Coatings Technology. vol. 136, iss. 1-3, pp. 65- 8, February 2001.

[11] T.M. Schneider and W.D. Sproul, “Reactive Sputtering,” Handbook of Thin Film Process Technology, vol. 98/1, pp. A5.1:1-12, 1998.

[12] J. Sellers, “Asymmetric bipolar pulsed DC: The enabling technology for reactive PVD,” Surface and Coatings Technology. vol. 98, no. 1, pp. 1245-1250(6), January 1998.

[13] K.E. Cooke, J. Hamsphire, W. Southall and D.G. Teer, “Industrial application of pulsed DC bias power supplies in closed field unbalanced magnetron sputter ion plating,” Surface Engineering. vol. 20, no. 3, pp. 189-195(7), June 2004.

[14] A. Belkind, A. Freilich and R. Scholl, “Using pulsed direct current power for reactive sputtering of Al2O3,” Journal of vacuum science and technology A, vol.17, iss.4,pp.1934-1940, July 1999.

[15]C. Muratore, J.J. Moore and J.A. Rees, “Electrostatic quadrupole plasma mass spectrometer and Langmuir probe measurements of mid-frequency pulsed DC magnetron discharges,” Surface and Coatings Technology. vol. 163-164, pp. 12-18, January 2003.

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