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Ion Beam Measurements of a Low Pressure Plasma Focus

Yap, S.L., and Larour, J., and Choi, P., and Rous, J., and Dine, S., and Pavelescu, G., and Favre, M., and Guilbert, A., and Wong, C.S., (2002) Ion Beam Measurements of a Low Pressure Plasma Focus. Jurnal Fizik Malaysia, 23 (1 - 4). pp. 47-48. ISSN 0128-0333

Full text not available from this repository.

Affiliations

University of Malaya. Faculty of Science. Dept. of Physics. Plasma Research Laboratory.
Ecole Polytechnique. Laboratoire de Physique et Technolagie des Plasmas.
Ecole Polytechnique. X-technologies.
National Institute of Opto Electronics.
Pontificia Universidad Catolica de Chile.

Abstract

In this project we have modified the geometry of the Mather type plasma focus for the investigation of the production of the ion beams at low pressure. The system has an insulator that is well shielded between the electrodes and the discharge is initiated by a set of cable runs placed around the cathodes. Successful operation down to a filling pressure of 10⁻³ mbar has been achieved in this modified plasma focus device. The characteristics of the ion beam have been investigated by employing two ion collectors.

Item Type:Journal
Keywords:Plasma focus; low pressure; ion beam
Subjects:Q Science, Computer Science
T Technology, Engineering
ID Code:3495

[1] Low, Y.K. et al., Paper presented at PERFIK 2001, Crystal Crown Hotel, Petaling Jaya, Malaysia (Sept 2001).

[2] J. Larour et al., APS Plasma Physics meeting, Canada (Oct 2000).

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