%0 Journal Article
%@ 0128-0333 
%A Ng, K.H.
%A Liew, W.S.
%A Roslan Mohd Nor,  
%A Wong, C.S.
%D 2002
%F myais:988
%I Malaysian Institute of Physics (IFM)
%J Jurnal Fizik Malaysia
%K ICP; planar coil; RF; DLC
%N 1-4
%P 51-53
%T A Planar-coil Inductively coupled Plasma System for Thin Film Deposition
%U http://myais.fsktm.um.edu.my/988/
%V 23
%X A RF planar coil inductively coupled plasma (ICP) system is set up for the purpose of thin film deposition. The system is powered by a 13.56 MHz, 550 W, 50 $\omega$ RF generator. The RF power is transferred to the plasma via a planar induction coil. The impedance matching unit consists of an air core step-down transformer and a tunable vacuum capacitor. The typical E to H mode transition distinctive to the ICP has been observed in Ar, H? and H?-CH? admixture plasma. Plasma enhanced chemical vapor deposition (PECVD) of diamond-like carbon (DLC) film on silicon substrate is achieved using the system.