<mets:mets LABEL="Eprints Item" xsi:schemaLocation="http://www.loc.gov/METS/ http://www.loc.gov/standards/mets/mets.xsd http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-0.xsd" xmlns:xlink="http://www.w3.org/1999/xlink" OBJID="oai:myais.fsktm.um.edu.my:988" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:mods="http://www.loc.gov/mods/v3" xmlns:mets="http://www.loc.gov/METS/"><mets:metsHdr CREATEDATA="2009-01-09T10:56:34Z"><mets:agent TYPE="ORGANIZATION" ROLE="CUSTODIAN"><mets:name>Malaysian Abstracting and Indexing System</mets:name></mets:agent></mets:metsHdr><mets:dmdSec ID="DMD_oai:myais.fsktm.um.edu.my:988_mods"><mets:mdWrap MDTYPE="mods"><mets:xmlData><mods:titleInfo><mods:title>A Planar-coil Inductively coupled Plasma System for Thin Film Deposition</mods:title></mods:titleInfo><mods:name type="personal"><mods:namePart type="given">K.H.</mods:namePart><mods:namePart type="family">Ng</mods:namePart><mods:role><mods:roleTerm type="text">author</mods:roleTerm></mods:role></mods:name><mods:name type="personal"><mods:namePart type="given">W.S.</mods:namePart><mods:namePart type="family">Liew</mods:namePart><mods:role><mods:roleTerm type="text">author</mods:roleTerm></mods:role></mods:name><mods:name type="personal"><mods:namePart type="given"> </mods:namePart><mods:namePart type="family">Roslan Mohd Nor</mods:namePart><mods:role><mods:roleTerm type="text">author</mods:roleTerm></mods:role></mods:name><mods:name type="personal"><mods:namePart type="given">C.S.</mods:namePart><mods:namePart type="family">Wong</mods:namePart><mods:role><mods:roleTerm type="text">author</mods:roleTerm></mods:role></mods:name><mods:abstract>A RF planar coil inductively coupled plasma (ICP) system is set up for the purpose of thin film deposition. The system is powered by a 13.56 MHz, 550 W, 50 $\omega$ RF generator. The RF power is transferred to the plasma via a planar induction coil. The impedance matching unit consists of an air core step-down transformer and a tunable vacuum capacitor. The typical E to H mode transition distinctive to the ICP has been observed in Ar, H₂ and H₂-CH₄ admixture plasma. Plasma enhanced chemical vapor deposition (PECVD) of diamond-like carbon (DLC) film on silicon substrate is achieved using the system.</mods:abstract><mods:classification authority="lcc">Q Science, Computer Science</mods:classification><mods:originInfo><mods:dateIssued encoding="iso8061">2002</mods:dateIssued></mods:originInfo><mods:originInfo><mods:publisher>Malaysian Institute of Physics (IFM)</mods:publisher></mods:originInfo><mods:genre>Journal</mods:genre></mets:xmlData></mets:mdWrap></mets:dmdSec><mets:amdSec ID="TMD_oai:myais.fsktm.um.edu.my:988"><mets:rightsMD ID="rights_oai:myais.fsktm.um.edu.my:988_mods"><mets:mdWrap MDTYPE="mods"><mets:xmlData><mods:useAndReproduction>
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