TY  - JOUR
ID  - myais988
UR  - http://eprints.ictp.it/201/
IS  - 1-4
A1  - Ng, K.H.
A1  - Liew, W.S.
A1  - Roslan Mohd Nor,  
A1  - Wong, C.S.
Y1  - 2002///
N2  - A RF planar coil inductively coupled plasma (ICP) system is set up for the purpose of thin film deposition. The system is powered by a 13.56 MHz, 550 W, 50 $\omega$ RF generator. The RF power is transferred to the plasma via a planar induction coil. The impedance matching unit consists of an air core step-down transformer and a tunable vacuum capacitor. The typical E to H mode transition distinctive to the ICP has been observed in Ar, H? and H?-CH? admixture plasma. Plasma enhanced chemical vapor deposition (PECVD) of diamond-like carbon (DLC) film on silicon substrate is achieved using the system.
PB  - Malaysian Institute of Physics (IFM)
JF  - Jurnal Fizik Malaysia
VL  - 23
KW  - ICP; planar coil; RF; DLC
SN  - 0128-0333 
TI  - A Planar-coil Inductively coupled Plasma System for Thin Film Deposition
SP  - 51
AV  - none
EP  - 53
ER  -